FULLY AUTOMATED,
SEMI-AUTOMATED AND
MANUAL WET BENCHES
Thermco design and manufacture a comprehensive range of wet benches for semiconductor and related electronic manufacturing processes. From simple manual stand-alone R&D applications, to fully automated production wet benches with connectivity to the fab host via SECS/GEM.
WET PROCESSING SYSTEMS
- Clean & Etch
- Pre-diffusion / RCA Clean
- Standard Clean SC1, SC2
- BHF / BOE, QDR
- Ultrasonic, Megasonic,
Agitation - Metal Lift-off
- Porous Si
- Single wafer cleaning
- Electroless metal deposition
Au, Ni, Pd, Cu, Ag - Furnace Tube & Quartzware
Cleaners - MEMS Process Systems
- Bespoke Processes
- Aqueous & Solvent applications
R&D, PILOT PROCESS, VOLUME PRODUCTION
High reliability process solutions for FEOL and BEOL technologies
R&D, PILOT PROCESS, VOLUME PRODUCTION
Cassette load-unload processing of 25 – 50 ≤ 300mm substrates. 3-axis ultra reliable cartesian robot serving multiple process and rinse baths.
Reduced Surface Tension Dryer or SRD. Multiple recipe setting via HMI with P&ID real-time display and maintenance facility. SCADA based control system with full SECS/GEM interface to fab host.
WET BENCH OPTIONS
Process baths with filtered recirculation, chemical monitoring and dosing control, ultrasonic, megasonic, and robotic agitation in a variety of materials including
Polypropylene, Quartz, PVDF, and PFA. QDR with resistivity monitoring & recirculation / weir bath. Glove wash and sample port. Solvent or Aqueous applications, stainless steel or Polypropylene construction, Fire Suppressant System and FM4910 compliance.
HMI AND CONTROL SYSTEM
PLC based control system with 64-bit SCADA designed for process control, manufacturing systems and open automation applications. Compatible with .NET platform and Microsoft operating systems.
