AUTOMATED,
SEMI-AUTOMATED AND
MANUAL WET BENCHES
Thermco design and manufactures a comprehensive range of wet benches for semiconductor and related electronic manufacturing processes. From simple manual stand-alone R&D applications, to fully automated production wet benches with connectivity to the fab host via SECS/GEM.
WET PROCESSING SYSTEMS
- Clean & Etch
- Pre-diffusion / RCA Clean
- Standard Clean SC1, SC2
- BHF / BOE, QDR
- Ultrasonic, Megasonic,
Agitation - Metal Lift-off
- Porous Si
- Single wafer cleaning
- Electroless metal deposition
Au, Ni, Pd, Cu, Ag - Furnace Tube & Quartzware
Cleaners - MEMS Process Systems
- Bespoke Processes
- Aqueous & Solvent applications
R&D, PILOT PROCESS, VOLUME PRODUCTION
High reliability process solutions for FEOL and BEOL technologies
R&D, PILOT PROCESS, VOLUME PRODUCTION
Cassette load-unload processing of 25 – 50 ≤ 300mm substrates. 3-axis ultra-reliable cartesian robot serving multiple processes and rinse baths.
Reduced Surface Tension Dryer or SRD. Multiple recipe settings via HMI with P&ID real-time display and maintenance facility. SCADA based control system with full SECS/GEM interface to fab host.
WET BENCH OPTIONS
Process baths with filtered recirculation, chemical monitoring and dosing control, ultrasonic, mega-sonic, and robotic agitation in a variety of materials including
Polypropylene, Quartz, PVDF, and PFA. QDR with resistivity monitoring & recirculation/weir bath. Glove wash and sample port. Solvent or Aqueous applications, stainless steel or Polypropylene construction, Fire suppression system and FM4910 compliance.
HMI AND CONTROL SYSTEM
PLC-based control system with 64-bit SCADA designed for process control, manufacturing systems and open automation applications. Compatible with the .NET platform and Microsoft operating systems.
